Evaluation of Iron Nitride Film Resistors Deposited by Reactive Sputtering Method.

Growth, structural, and magnetic properties of iron nitride thin films deposited by dc magnetron sputtering

FeN thin films were deposited on glass substrates by dc magnetron sputtering at different Ar/N2 discharges. The composition, structure and the surface morphology of the films were characterized using X-ray photoelectron spectroscopy (XPS), X-ray diffraction (XRD), and atomic force microscopy (AFM). Films deposited at different nitrogen pressures exhibited different structures with different nit...

AlNXOY THIN FILMS DEPOSITED BY DC REACTIVE MAGNETRON SPUTTERING

AlNxOy thin films were produced by DC reactive magnetron sputtering, using an atmosphere of argon and a reactive gas mixture of nitrogen and oxygen, for a wide range of partial pressures of reactive gas. During the deposition, the discharge current was kept constant and the discharge parameters were monitored. The deposition rate, chemical composition, morphology, structure and electrical resis...

Silicon Nitride Based Coatings Grown by Reactive Magnetron Sputtering

Silicon nitride and silicon nitride-based ceramics have several favorable material properties, such as high hardness and good wear resistance, which makes them important materials for the coating industry. This thesis focuses the synthesis of silicon nitride, silicon oxynitride, and silicon carbonitride thin films by reactive magnetron sputtering. The films were characterized based on their che...

Decorative Titanium Nitride Colored Coatings on Bell-Metal by Reactive Cylindrical Magnetron Sputtering

The transition metal nitrides like titanium nitride exhibit very interesting color variation properties depending on the different plasma deposition conditions using cylindrical magnetron sputtering method. It is found in this deposition study that nitrogen partial pressure in the reactive gas discharge environment plays a significant role on the color variation of the film coatings on bell-met...

X-Ray Analysis on Ceramic Materials Deposited by Sputtering and Reactive Sputtering for Sensing Applications